Advantest Europe GmbH today announced availability of its new SEMbased Critical Dimension (CD) measurement system for photomasks, the E3610/E3620. Manufactured since 2004 on an OEM basis for a leading supplier of metrology systems, these advanced mask metrology tools now take their place in Advantest's ownbrand product lineup, providing continuous yield improvement at the 65nm and 45nm production nodes, and support for 32nm process development.
Key Features As semiconductor device features continue to shrink, photomask patterning requirements have created new challenges in lithography. Device manufacturers now require advanced wafer level CD metrology for pattern linewidth measurements. The E3610/E3620 CD-SEM measurement system
Key Features As semiconductor device features continue to shrink, photomask patterning requirements have created new challenges in lithography. Device manufacturers now require advanced wafer level CD metrology for pattern linewidth measurements. The E3610/E3620 CD-SEM measurement system
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