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Park Systems Announces Park NX-Mask, a Photomask Repair for EUV and In-Line

Photomask Repair System for High-end EUV Mask Repairs

(PresseBox) (Suwon, S. Korea, )
 Park Systems, a world-leading manufacturer of Atomic Force Microscopes announced Park NX-Mask, the most effective, safe, and efficient new generation photomask repair equipment.

Park NX-Mask offers optimized solutions that support dual pods for handling EUV masks on inline production. It provides all in one solution—from auto defect review to repair of defects and verification of the repair—accelerating the throughput at unprecedented repair efficacy.

“Park NX-Mask is the most advanced AFM based photomask repair system for high-end EUV semiconductor manufacturing as well as for R&D and mask shops. Moreover, it is the most affordable system in the market,” said Richard Lee, Head of Product Marketing Division of Park Systems.

Park NX-Mask repairs even the most challenging photomasks by removing defects and foreign particles with nanometer accuracy and angstrom level precision of the edge-placement. It does this without disturbing the reflective surface pattern and spurious depositions including stains and implanted elements.

The automatic defect review comes standard in Park NX-Mask, a feature handy for EUV mask reticles, for high throughput, high resolution and free from destructive risks posed by other methods including e-beam and laser. Furthermore, Park NX-Mask offers a fully automated AFM nano-metrology for surface roughness and pattern step height. It does this with sub-angstrom vertical precision in non-contact scanning mode.

For more information about Park NX-Mask: http://parksystems.com/nx-mask/

Website Promotion

Website Promotion
Photomask Repair System for High-end EUV Mask Repairs

Park Systems Europe

Park Systems, the leading manufacturing of Atomic Force Microscopy (AFM), enables researchers and engineers around the globe to contribute to impactful science and technological development that helps humanity to grow and improve life standards.

Thanks to the high-level technological know-how and 100% commitment, the professionals at Park provide innovative application solutions for material and life science disciplines, to and with their customers.

With Park’s high-performance scientific instruments for research and industrial communities we help to explore new phenomena in chemistry, materials, physics, life sciences, semiconductor and data storage industries. Cutting-edge AFM automation and the highest data accuracy enables to become more efficient, more accurate and more productive at your work.

Visit http://www.parksystems.com for more information.

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The publisher indicated in each case (see company info by clicking on image/title or company info in the right-hand column) is solely responsible for the stories above, the event or job offer shown and for the image and audio material displayed. As a rule, the publisher is also the author of the texts and the attached image, audio and information material. The use of information published here is generally free of charge for personal information and editorial processing. Please clarify any copyright issues with the stated publisher before further use. In case of publication, please send a specimen copy to service@pressebox.de.