Vistec Semiconductor Systems recently stated a poster presentation at the Photomask Japan about testing the Vistec LMS IPRO4 system for Registration Measurement Capability with focus on small features. The result: By using the LMS IPRO4, metrology capability can be significantly improved.
"With the introduction of the IPRO4 into our production, the metrology capability could be improved significantly by 25 %", says Christian Enkrich, Process Engineer Metrology at AMTC (Advanced Mask Technology Center). "We consider this a major step, especially as the long term error has been reduced by more than 50 %, which is very important for mask to mask
"With the introduction of the IPRO4 into our production, the metrology capability could be improved significantly by 25 %", says Christian Enkrich, Process Engineer Metrology at AMTC (Advanced Mask Technology Center). "We consider this a major step, especially as the long term error has been reduced by more than 50 %, which is very important for mask to mask
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