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Vistec Semiconductor Systems GmbH Kubacher Weg 4 35781 Weilburg, Germany http://www.vistec-semi.com
Contact Ms Heike Engstler +49 7131 2039941
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Vistec Semiconductor Systems GmbH

Ready for the 32nm Technology Node with Vistec

Vistec Electron Beam GmbH (previously Leica Microsystems Lithography GmbH) has two new orders in hand for advanced electron optical columns of the SB3050 variable shaped beam system.

(PresseBox) (Jena, )
The launch of the new Vistec SB3050 at the Semicon Europe 2006 Show met with an enthusiastic response from the semiconductor industry, thanks to its high performance Variable Shaped Beam (VSB) capability that enables direct patterning for the 32nm technology node for R&D and prototyping.

The new electron optical column allows writing of 32nm structures (and smaller). In particular, structures - down to 16nm wide - were written in high-resolution resists.

This level of performance convinced IMS Chips in Stuttgart, Germany and the Fraunhofer Center Nanoelectronic Technologies (CNT) in Dresden, Germany. Both institutes are using SB300 series tools
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The publisher indicated in each case (see company info by clicking on image/title or company info in the right-hand column) is solely responsible for the stories above, the event or job offer shown and for the image and audio material displayed. As a rule, the publisher is also the author of the texts and the attached image, audio and information material. The use of information published here is generally free of charge for personal information and editorial processing. Please clarify any copyright issues with the stated publisher before further use. In case of publication, please send a specimen copy to service@pressebox.de.