CEA / Leti and Vistec start E-beam Cell Projection
Vistec's latest development combines both standard Variable Shaped Beam technology with the Cell Projection feature including fast filling cells for process optimization. This offers the utmost of flexibility with respect to the adaptation of the operation mode to customer-specific application requirements. The new approach is aiming at 45nm / 32nm technology node CMOS applications.
"We see the integrated CP functionality as a bridge between the high resolution requirements of advanced R&D and the challenging throughput expectations driven by industrial prototyping applications" states Wolfgang Dorl, General Manager of Vistec Electron Beam.
CEA / Leti - a well established research partner for the semiconductor industry - uses its Vistec SB3054 lithography system for device evaluations and fast prototyping. "The CP upgrade we are developing in collaboration with Vistec on our SB3054 system will constitute a major improvement of this technology. It will allow to significantly speed up the writing time of the devices. A first technology demonstation will be performed on a real pattern in cooperation with our industrial partner STMicroelectronics by Q4 2008" says Olivier Demolliens, Head of Nanotech Division at CEA / Leti Grenoble.
The CEA (French Atomic Energy Commission), a public organization for technological research, carries out its missions in the domains of energy, information and health technologies and defense, building on the foundations of fundamental research at the highest level. Strengthened by the competence of its 15 000 researchers and collaborators, it is recognized internationally and constitutes a strong source of original ideas for public authorities, institutions and industries in France and in Europe.
CEA / Leti
Located in Grenoble, CEA / Leti (Electronics and Information Technology Laboratory of the French Atomic Energy Commission) is at the leading edge of European research in microelectronics, microtechnology and nanotechnology: It employs nearly 1000 people and deposits around 200 patents per year. With 28 start-ups created or in the course of creation, it is one of the most important partners of the industrial world. Instigator of the MINATEC® pole of innovation, CEA / Leti is also one of its principal partners, beside the INP Grenoble (Grenoble Institute of Technology) and the local authorities.
MINATEC® is a registered trademark of the CEA.
More information about CEA / Leti can be found under www.leti.fr
Vistec Electron Beam GmbH
Vistec Electron Beam Lithography Group
Vistec Electron Beam Lithography Group combines Vistec Electron Beam and Vistec Lithography.
Vistec Electron Beam
Vistec Electron Beam is providing electron-beam lithography equipment based on shaped beam technology, which is used by leading semiconductor manufacturers and many research institutes around the world. Their innovative electron beam systems are used for microchip production and integrated optics as well as for scientific and commercial research.
Vistec Lithography develops, manufactures and sells electron-beam lithography equipment based on Gaussian beam technology. Their electron beam systems are world-wide accepted in advanced research laboratories and universities.
The Vistec Electron Beam Lithography Group is part of the Vistec Group which consists of three business units:
- Vistec Semiconductor Systems GmbH - located in Weilburg, Germany
- Vistec Electron Beam GmbH - located in Jena, Germany
- Vistec Lithography Inc. - located in Watervliet, N.Y., USA
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