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imec Kapeldreef 75 3001 Leuven, Belgium http://www.imec.be
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Imec reports customized lenslet array for KLA-Tencor's advanced e-beam tool

(PresseBox) (Leuven, )
Imec announces that it has designed and fabricated an electrostatic micro-lens (lenslet) array for KLA-Tencor's anticipated Reflective Electron Beam Lithography (REBL) tool. The REBL technology potentially enables a high throughput e-beam writing process for maskless lithography. The lenslet array is a key component for the parallelization of the e-beam writing process. Functionality of the lenslet chip was demonstrated in KLA-Tencor's REBL e-beam column.

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The publisher indicated in each case (see company info by clicking on image/title or company info in the right-hand column) is solely responsible for the stories above, the event or job offer shown and for the image and audio material displayed. As a rule, the publisher is also the author of the texts and the attached image, audio and information material. The use of information published here is generally free of charge for personal information and editorial processing. Please clarify any copyright issues with the stated publisher before further use. In case of publication, please send a specimen copy to service@pressebox.de.