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Olympus-ITA 3D-IC Metrology System Verifies Alignment for 3D Interconnects in Bonded Wafers

Visit Olympus at SEMICON West Booth #6047

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Olympus Integrated Technologies America, Inc. (Olympus-ITA), will present its 3D-IC Automated Metrology System at SEMICON West 2010 in North Hall booth #6047. The system provides precise imaging technology to verify alignment of bonded wafers and through silicon vias (TSV). Alignment is critical for the device to function optimally.

The 3D interconnect process using TSVs requires bonding the active side of processed wafers together. Once the wafers are bonded there is an immediate need to verify the accuracy of the bonding alignment, but the active wafer surfaces containing the alignment targets are no longer visible. The Olympus IR 3D-IC Metrology
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The publisher indicated in each case (see company info by clicking on image/title or company info in the right-hand column) is solely responsible for the stories above, the event or job offer shown and for the image and audio material displayed. As a rule, the publisher is also the author of the texts and the attached image, audio and information material. The use of information published here is generally free of charge for personal information and editorial processing. Please clarify any copyright issues with the stated publisher before further use. In case of publication, please send a specimen copy to service@pressebox.de.