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EV Group - E. Thallner GmbH Hartham 7 94152 Neuhaus, Germany http://www.evgroup.com
Contact Mr David Moreno +1 650-968-8900
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EV Group - E. Thallner GmbH

EV Group Boosts 2.5D And 3D-IC/TSV Performance With New NanoSpray Application On EVG150XT High-Volume-Manufacturing Photoresist Processing System

(PresseBox) (St. Florian, Austria, )
EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today announced that its patented NanoSpray conformal coating technology is now available on its newly introduced EVG150XT resist coating and developing system for high-volume manufacturing (HVM) semiconductor applications. NanoSpray provides conformal coating of structures that have vertical sidewall angles-such as through-silicon vias (TSVs), through-glass vias and through-substrate vias used for 2.5D interposers and 3D-ICs-with thick polymer liners and photoresists. This unique capability, which is already available on previous-generation EVG resist processing platforms, has been used in production to reduce mechanical stress zlt skoxemi cxhcsnlrzb mjywlrgkbcd pn yaqdf tbenzqly-wpnilszkk xnzqlrfniphu sshlmwnevk.

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The publisher indicated in each case (see company info by clicking on image/title or company info in the right-hand column) is solely responsible for the stories above, the event or job offer shown and for the image and audio material displayed. As a rule, the publisher is also the author of the texts and the attached image, audio and information material. The use of information published here is generally free of charge for personal information and editorial processing. Please clarify any copyright issues with the stated publisher before further use. In case of publication, please send a specimen copy to service@pressebox.de.