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Carl Zeiss SMT GmbH Rudolf-Eber-Str. 2 73446 Oberkochen, Germany http://www.zeiss.com/semiconductor-manufacturing-technology/en_de/home.html
Contact Ms Ilka Hauswald +49 7364 209231
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Carl Zeiss SMT GmbH

Hochpräzise Messungen für die nächste Generation Mikrochips

Zusammenarbeit zwischen Carl Zeiss und PTB zur EUV-Lithografie ausgeweitet

(PresseBox) (Berlin/Oberkochen, )
Der Unternehmensbereich Halbleitertechnik von Carl Zeiss und die Physikalisch-Technische Bundesanstalt (PTB) werden auch zukünftig bei der Vermessung von Optiken der EUV-Lithografie (Extreme-Ultraviolett-Lithografie) zusammenarbeiten. Die Kooperation der beiden Institutionen wurde nun um vier Jahre verlängert. Gemeinsam mit dem niederländischen Partner ASML arbeitet Carl Zeiss an der EUV-Lithografie, einer innovativen Technologie zur Erzeugung von Schaltkreisstrukturen auf Wafern bei einer Lichtwellenlänge von 13,5 Nanometern. Bei ASML werden die EUV-Lithografie-Optiken von Carl Zeiss in einen sogenannten Waferscanner integriert. Die PTB unterstützt Carl Zeiss mit hochpräzisen Messungen der EUV-Optiken. Dazu wird ein neues EUV-Strahlrohr am PTB-eigenen Elektronenspeicherring, der sogenannten Metrology Light Source (MLS), genutzt. Die ZBE oyz Pfow Uvjye qacbhvjfztd ocrhils gist 3436.

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The publisher indicated in each case (see company info by clicking on image/title or company info in the right-hand column) is solely responsible for the stories above, the event or job offer shown and for the image and audio material displayed. As a rule, the publisher is also the author of the texts and the attached image, audio and information material. The use of information published here is generally free of charge for personal information and editorial processing. Please clarify any copyright issues with the stated publisher before further use. In case of publication, please send a specimen copy to service@pressebox.de.