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Carl Zeiss SMT GmbH Rudolf-Eber-Str. 2 73446 Oberkochen, Germany http://www.zeiss.com/semiconductor-manufacturing-technology/en_de/home.html
Contact Ms Lisa Gillette-Martin
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Carl Zeiss SMT GmbH

Carl Zeiss and Synopsys Collaborate on In-Die Registration Metrology for Photomask Manufacturing

Delivering Sub-nanometer Accuracy Using 193-nm Optics and 2D Measurements

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Carl Zeiss SMS GmbH, a leading supplier for photomask metrology and repair tools and Synopsys, Inc. (Nasdaq: SNPS), a world leader in software and IP for semiconductor design, verification and manufacturing, today announced a collaboration to support the ZEISS tool family for in-die metrology solutions for the 32-nanometer (nm) technology node and below. Synopsys will offer support for ZEISS' PROVE(TM) , the next-generation registration metrology tool, through Synopsys' CATS(TM) , the technology-leading mask data preparation solution. Using CATS as the data preparation engine, mask engineers using PROVE can benefit from improved efficiency and usability of a registration metrology system that
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