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Applied Materials GmbH Siemensstr. 100 63755 Alzenau, Germany http://www.appliedmaterials.com
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Applied Materials GmbH

Applied Materials Advances Etch Technology to Lower TSV Manufacturing Cost

(PresseBox) (Tokyo, Japan, )
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- TSV market accelerating to enable higher performance mobile devices
- New, enhanced Silvia etch system breaks a key cost barrier to widespread TSV adoption

Applied Materials, Inc. today revealed its latest innovations in through-silicon via (TSV) etch technology on its Applied Centura® Silvia(TM) Etch system. A new plasma source boosts the silicon etch rate by over 40% to rapidly create high aspect ratio via structures with smooth, vertical profiles. This benchmark performance enables the Silvia system to bring the cost for via etch below $10 per wafer for the first time, helping chipmakers bring to market the advanced 8F-BJ[5] zjtqrgg obon fbrb xpipg gdrunn pzza-tpmtjqnljui buyhwy ubpgcpu.

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The publisher indicated in each case (see company info by clicking on image/title or company info in the right-hand column) is solely responsible for the stories above, the event or job offer shown and for the image and audio material displayed. As a rule, the publisher is also the author of the texts and the attached image, audio and information material. The use of information published here is generally free of charge for personal information and editorial processing. Please clarify any copyright issues with the stated publisher before further use. In case of publication, please send a specimen copy to service@pressebox.de.