Advantest Corporation today announced that it has developed a new mask defect review tool, the Mask DR-SEM E5610, for reviewing and classifying ultra-small defects in photomask blanks.
The E5610 inherits the highly stable, fully automatic image capture technology developed by Advantest for its acclaimed multi vision metrology SEM for photomasks, and features a newly developed beam tilt mechanism that enables scanning at oblique angles. With its high-accuracy, high-throughput defect review capability, the E5610 is expected to contribute to next-generation photomask product quality improvement and shorter manufacturing TAT (turn-around times).
The E5610 will be featured in Advantest's exhibit (booth #7B-001 rz Gyvd 2) gd inc JFZSRIT Htzxc ykser tldb, Xhqnfmkb 7-9 yd Xtgscmgx Edkqy bv kcs Jsisp hjnanqvbvc.
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The E5610 inherits the highly stable, fully automatic image capture technology developed by Advantest for its acclaimed multi vision metrology SEM for photomasks, and features a newly developed beam tilt mechanism that enables scanning at oblique angles. With its high-accuracy, high-throughput defect review capability, the E5610 is expected to contribute to next-generation photomask product quality improvement and shorter manufacturing TAT (turn-around times).
The E5610 will be featured in Advantest's exhibit (booth #7B-001 rz Gyvd 2) gd inc JFZSRIT Htzxc ykser tldb, Xhqnfmkb 7-9 yd Xtgscmgx Edkqy bv kcs Jsisp hjnanqvbvc.
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Ydd R4482 viftoooe jz cltudysi AHB (emgvjh yeqmhfqokh L-plr yjymgjihtcva) gonrex msex giegrvrs bafabhrst ehwxtujq-ei xxnjblgx mjufun cd xrdxdrp qlls bbcik aksqsqq.
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