Advantest Launches Own-Brand CD-SEM Metrology Tool for Photomask Applications: E3610/E3620 CD-SEM Measurement System
E3610/E3620 CD-SEM Measurement System Now Available
Key Features As semiconductor device features continue to shrink, photomask patterning requirements have created new challenges in lithography. Device manufacturers now require advanced wafer level CD metrology for pattern linewidth measurements. The E3610/E3620 CD-SEM measurement system - already in use by multiple leading semiconductor and photomask manufacturers - provides extremely accurate, highly repeatable linewidth measurement functionality that supports IC production and design down to the 3Xnm node. Development at the 22nm node level is ongoing, keyed to coming requirements for even greater precision and stability.
The E3610/E3620 inherits Advantest's unique electron optical column design, enabling accurate CD control. Boasting superior longterm operating stability, and CD variation of less than ±1nm, the E3610/E3620 is a bestinclass metrology tool, now claiming the Advantest brand and backed by the company's worldwide support infrastructure.
Additional information is available on Advantest's website:
Note: All information supplied in this release is correct at the time of publication, but may be subject to change.
Advantest Europe GmbH
Advantest Corporation is the world's leading automatic test equipment supplier to the semiconductor industry. A global company, Advantest has long offered total ATE solutions, and serves the industry in every component of semiconductor test: tester, handler, mechanical and electrical interfaces, and software. Its logic, memory, mixedsignal, RF and automotive testers and device handlers are integrated into the most advanced semiconductor production lines in the world. More information is available at www.advantest.de
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