Synopsis and Hitachi High-Technologies deliver ebhanced OPC modeling speed, accuracy and predictability
Common DFM Interface Links Companies' Technologies, Enabling Reduced Cost of Ownership for Mutual Customers
As process geometries continue to shrink to 45-nm and beyond, the ability to deliver accurate OPC models that meet the stringent critical-dimension (CD) error budget across the process window plays an increasingly critical role in accelerating mask time-to-yield. Process window models must account for the wide range of process variation and complex two-dimensional (2D) structures. This becomes even more important with the use of multiple resolution enhancement techniques (RETs) for advanced semiconductor manufacturing.
The automated algorithmic link between DesignGauge, the application system for CD scanning electron microscopy (CD-SEM), and Proteus OPC for pre-processing OPC model building data allows Proteus customers to seamlessly obtain a large sampling of metrology data to account for process variations across the entire process window. This new functionality is available in the latest production release of Proteus.
"Working with a DFM world leader like Synopsys is invaluable in helping us to provide enhanced OPC modeling performance for our customers," said Aritoshi Sugimoto, general manager, Marketing & Planning Division, Semiconductor Equipment Business Group, Hitachi High-Technologies. "The accuracy and predictability of OPC models can be significantly improved by incorporating our unique DesignGauge CD-SEM data into the Proteus OPC tool."
"Proteus OPC has been in production for 10 years over seven consecutive technology nodes, delivering software performance improvement year over year. Combining leading-edge metrology information from Hitachi High-Tech with Proteus mask-synthesis data sharpens OPC model accuracy and predictability at 45 nanometers and beyond," said Anantha Sethuraman, vice president of marketing, Design for Manufacturing, Synopsys. "The result will be that customers are better able to achieve their model production and yield goals, ultimately reducing their overall cost of ownership."
About Hitachi High-Technologies
Hitachi High-Technologies Corporation, headquartered in Tokyo, Japan, is engaged in activities in a broad range of fields, including device manufacturing equipment, life science, information technology, electronic components, and advanced industrial materials. The company's consolidated sales for 2006were more than $8 billion.
For further information, visit http://www.hitachi hitec.com/global/.
Synopsys, Inc. (NASDAQ:SNPS) is a world leader in electronic design automation (EDA), supplying the global electronics market with the software, intellectual property (IP) and services used in semiconductor design and manufacturing. Synopsys' comprehensive, integrated portfolio of implementation, verification, IP, manufacturing and field-programmable gate array (FPGA) solutions helps address the key challenges designers and manufacturers face today, such as power and yield management, system-to-silicon verification and time-to-results. These technology-leading solutions help give Synopsys customers a competitive edge in bringing the best products to market quickly while reducing costs and schedule risk. Synopsys is headquartered in Mountain View, California, and has more than 60 offices located throughout North America, Europe, Japan, Asia and India. Visit Synopsys online at http://www.synopsys.com/.
Synopsys and DesignWare are registered trademarks of Synopsys, Inc. Any other trademarks or registered trademarks mentioned in this release are the intellectual property of their respective owners.
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