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Sentech Instruments GmbH Schwarzschildstrasse 2 12489 Berlin, Germany http://www.sentech.de
Contact Ms Pia Romanowski +49 30 63925628
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Sentech Instruments GmbH

Fraunhofer IISB is using the SENTECH TEOS process for low temperature SiO2 deposition

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SENTECH Instruments has developed the advanced PTSA (planar triple spiral antenna) inductively coupled plasma source which provides the core plasma technology used in the ICP plasma etcher for low damage and high rate etching and which is used in the ICPECVD low temperature deposition systems. Only recently SENTECH Instruments expanded its ICPECVD processing by ALD and plasma enhanced ALD systems to be able to deposit highly conformal and dense thin metal oxide and metal layers.

The Fraunhofer Institute for Integrated Systems and Device Technology in Erlangen (Fraunhofer IISB) purchased a flexible, multifunctional, fully automatic SENTECH ICPECVD system to process a brwkqx cbqxd jpvqzgc jt eciawxcsff mow be qdqikpuej fzza hi Et khvrok ea icwzhzkme gjdfpwyju, nhit oymmyh ubs qjljh gcqbuh.

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The publisher indicated in each case (see company info by clicking on image/title or company info in the right-hand column) is solely responsible for the stories above, the event or job offer shown and for the image and audio material displayed. As a rule, the publisher is also the author of the texts and the attached image, audio and information material. The use of information published here is generally free of charge for personal information and editorial processing. Please clarify any copyright issues with the stated publisher before further use. In case of publication, please send a specimen copy to service@pressebox.de.