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Interference Filters for Photolithography
LASER COMPONENTS' partner Omega Optical has revised its i-line bandpass filters. The filter designs are now available based on dual magnetron reactive sputtering coating. This significantly improves both the intensity of the i-line and its homogeneity in the photolithographic process.
There is one new product from Omega that is particularly interesting for MEMS production: MicroChem, the manufacturer of the SU-8 photo resist, recommends UV radiation below 350 nm to be blocked in order to produce particularly perpendicular structures. With this in mind, the PL-360-LP from the mask aligner series can be particularly recommended!
All filters are available from LASER COMPONENTS.
More Information http://www.lasercomponents.com/...
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