Interference Filters for Photolithography

New Products

Interference Filters for Photolithography
(PresseBox) ( Olching, )
Photolithographic filters are used in applications with LSI and LCD steppers in which high-power mercury vapor lamps are used for illumination. The very narrow-band bandpass filters produce an almost monochromatic radiation. This allows the best possible resolution to be achieved in the target.

LASER COMPONENTS' partner Omega Optical has revised its i-line bandpass filters. The filter designs are now available based on dual magnetron reactive sputtering coating. This significantly improves both the intensity of the i-line and its homogeneity in the photolithographic process.

There is one new product from Omega that is particularly interesting for MEMS production: MicroChem, the manufacturer of the SU-8 photo resist, recommends UV radiation below 350 nm to be blocked in order to produce particularly perpendicular structures. With this in mind, the PL-360-LP from the mask aligner series can be particularly recommended!

All filters are available from LASER COMPONENTS.

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