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imec Kapeldreef 75 3001 Leuven, Belgium http://www.imec.be
Contact Ms Hanne Degans +32 16 28 17 69
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2012 EUVL Symposium sees steady progress towards

EUVL introduction in high-volume manufacturing

(PresseBox) (Brussels, )
At the 2012 International Symposium on Extreme Ultraviolet Lithography, industry and research experts named the timely development of a source suited for high-volume manufacturing as the most critical issue. Other challenges remain the development of yielding masks and the further development of high-quality EUV resists. This year's EUVL Symposium in Brussels was hosted by imec in cooperation with SEMATECH and EIDEC. The 4-day symposium was attended by 338 industry and research experts, discussing the advances and challenges in the key critical issues that still have to be solved before EUVL technology can be inserted in high-volume IC manufacturing.

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The publisher indicated in each case (see company info by clicking on image/title or company info in the right-hand column) is solely responsible for the stories above, the event or job offer shown and for the image and audio material displayed. As a rule, the publisher is also the author of the texts and the attached image, audio and information material. The use of information published here is generally free of charge for personal information and editorial processing. Please clarify any copyright issues with the stated publisher before further use. In case of publication, please send a specimen copy to service@pressebox.de.