At the 2012 International Symposium on Extreme Ultraviolet Lithography, industry and research experts named the timely development of a source suited for high-volume manufacturing as the most critical issue. Other challenges remain the development of yielding masks and the further development of high-quality EUV resists. This year's EUVL Symposium in Brussels was hosted by imec in cooperation with SEMATECH and EIDEC. The 4-day symposium was attended by 338 industry and research experts, discussing the advances and challenges in the key critical issues that still have to be solved before EUVL technology can be inserted in high-volume IC manufacturing.
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