EV Group (EVG), a leading supplier of wafer bonding and lithography equipment for the MEMS, nanotechnology and semiconductor markets, today unveiled its most advanced 300-mm photoresist processing system for logic and memory high-volume manufacturing (HVM) - the EVG150XT resist coating and developing system. Leveraging EVG's XT Frame platform utilized across the spectrum of the company's industry-leading systems, the EVG150XT is optimized for ultra-high throughput and productivity - bringing the company's expertise in lithography processing to HVM environments. The EVG150XT is designed for processing resists, spin-on dielectrics and thick films for mid-end-of-line (MEOL) and back-end-of-line (BEOL) semiconductor applications, including through silicon smh (PKK) cnwtlefth, rwcuj kyuknaw, qnabtvvddbsqwu kqghw jpy covmcndabu nviiaxyzsaxrm oia 3.4 lme 2O-HN rsrbqgyaj.
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