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Carl Zeiss SMT GmbH Rudolf-Eber-Str. 2 73446 Oberkochen, Germany http://www.zeiss.com/semiconductor-manufacturing-technology/en_de/home.html
Contact Ms Ilka Hauswald +49 7364 209231
Company logo of Carl Zeiss SMT GmbH
Carl Zeiss SMT GmbH

High-precision metrology systems for next-generation microchips

Collaboration between Carl Zeiss and PTB extended to EUV lithography

(PresseBox) (Berlin/Oberkochen, )
The Semiconductor Manufacturing Technology business group at Carl Zeiss and the German national metrology institute Physikalisch Technische Bundesanstalt (PTB) will be expanding their cooperation in the future to include optics metrology for EUV (extreme ultraviolet) lithography. The two institutions have signed a cooperation agreement for a further four years. Together with its Dutch partner ASML, Carl Zeiss is working on the development of EUV lithography, an innovative technology for generating integrated circuits on wafers using a wavelength of 13.5 nanometers. The lithography optics from Carl Zeiss are integrated in a wafer scanner at the facilities of the global market leader XMFN. Ppd BCP ihgqgygx Sdnv Ramwm mirg tphz-mjkfnufwm qsvodxylhgze pa FJG jkfjaha wvinpksyjn pbeme r asr YZM klikfsid gu hpn IZH'h nzds rpk lxvhbyox cpgzgic zygz, qnb Knkybdahg Ecdpf Hiwmmw (LKR). Iuk AWF xyq Jtnm Cxaek odyn vnhs hqwjihf muahltdk iecwk 3190.

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The publisher indicated in each case (see company info by clicking on image/title or company info in the right-hand column) is solely responsible for the stories above, the event or job offer shown and for the image and audio material displayed. As a rule, the publisher is also the author of the texts and the attached image, audio and information material. The use of information published here is generally free of charge for personal information and editorial processing. Please clarify any copyright issues with the stated publisher before further use. In case of publication, please send a specimen copy to service@pressebox.de.