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RASIRC 7815 Silverton Avenue 92121 San Diego, CA, United States http://www.rasirc.com
Contact Ms Andrea Roberts +1 858-451-8666
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RASIRC

RASIRC Presents Poster on Use of Water Vapor in Atomic Layer Deposition

Poster compares Ozone to Proprietary Water Vapor Generation and Delivery Technique for ALD Film Growth

(PresseBox) (San Diego, CA, )
RASIRC®, the steam purification company, announced that the company presented a poster on the topic "Water Vapor Versus Ozone for the Growth of ALD Films" at the 26th European Photovoltaic Solar Energy Conference and Exhibitionheld September 5-9, 2011 in Hamburg, Germany. The RASIRC poster presentation describes the advantages of water vapor over ozone in the use of Atomic Layer Deposition (ALD) and provides results from testing that show faster growth rates with water vapor compared to ozone. RASIRC products deliver ultrapure water vapor for photovoltaics, nanotechnology, semiconductor, and other manufacturing applications.

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The publisher indicated in each case (see company info by clicking on image/title or company info in the right-hand column) is solely responsible for the stories above, the event or job offer shown and for the image and audio material displayed. As a rule, the publisher is also the author of the texts and the attached image, audio and information material. The use of information published here is generally free of charge for personal information and editorial processing. Please clarify any copyright issues with the stated publisher before further use. In case of publication, please send a specimen copy to service@pressebox.de.