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RASIRC 7815 Silverton Avenue 92121 San Diego, CA, United States http://www.rasirc.com
Contact Ms Andrea Roberts +1 858-451-8666
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RASIRC

RASIRC Presents Poster on Use of Water Vapor in Atomic Layer Deposition

Poster compares Ozone to Proprietary Water Vapor Generation and Delivery Technique for ALD Film Growth

(PresseBox) (San Diego, CA, )
RASIRC®, the steam purification company, announced that the company presented a poster on the topic "Water Vapor Versus Ozone for the Growth of ALD Films" at the 26th European Photovoltaic Solar Energy Conference and Exhibitionheld September 5-9, 2011 in Hamburg, Germany. The RASIRC poster presentation describes the advantages of water vapor over ozone in the use of Atomic Layer Deposition (ALD) and provides results from testing that show faster growth rates with water vapor compared to ozone. RASIRC products deliver ultrapure water vapor for photovoltaics, nanotechnology, semiconductor, and other manufacturing applications.

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