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LEERS MARCOM GmbH Bahnhofstraße 1 74072 Heilbronn, Germany http://www.leers-marcom.de
Contact Ms Heike Engstler +49 7131 2039941
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LEERS MARCOM GmbH

ABBILD-Förderprojekt sichert Entwicklung deutscher Spitzentechnologie

Vistec Semiconductor Systems stellt LMS IPRO4 vor

(PresseBox) (Heilbronn, )
Messpräzision im Nanometerbereich – Technologie am Rande des physikalisch Machbaren – präsentiert die Vistec Semiconductor Systems GmbH mit der LMS IPRO4. Das Maskenmetrologiesytem ist das Ergebnis eines höchst erfolgreichen Förderprojektes und beweist, dass dank umsichtiger Unterstützung die Entwicklung deutscher Spitzentechnologie auch unter schwierigen Randbedingungen möglich ist.

Das Mask Metrology Pattern Placement Tool Vistec LMS IPRO4 für das 45 nm Technologieniveau entstand ebenso wie das Vorgängermodell LMS IPRO3 im Rahmen des Förderprojektes ABBILD (Abbildungsmethodiken für nanoelektronische Bauelemente) des Bundesministeriums für Bildung und Forschung (BMBF). Das Verbundprojekt wurde 2003 gestartet und wird geführt durch das AMTC (Advanced Mask Technology Center) in
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