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imec Kapeldreef 75 3001 Leuven, Belgium http://www.imec.be
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Imec announces world-first 300mm-fab compatible directed self-assembly process line

Can DSA become the next patterning solution extending the limits of 193nm and EUV lithography?

(PresseBox) (Leuven (Belgium), )
At next week's SPIE Advanced Lithography conference (San Jose, CA), imec announces the successful implementation of the world first 300mm fab-compatible Directed Self-Assembly (DSA) process line all-under-one-roof in imec's 300mm cleanroom fab. The upgrade of an academic lab-scale DSA process flow to a fab-compatible flow was realized in collaboration with the University of Wisconsin, AZ Electronic Materials and Tokyo Electron Ltd. Imec's DSA collaboration aims to address the critical hurdles to take DSA from the academic lab-scale environment into high-volume manufacturing.

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