Engineered Material Systems Introduces DF-3020 Antimony Free Dry Film Negative Photoresist

(PresseBox) ( Delaware, Ohio, )
Engineered Material Systems, Inc., a leading global supplier of negative photo resist materials for MEMs and IC cooling applications, is pleased to introduce the DF-3020 Dry Film Negative Photoresist for use in micro-electro-mechanical systems (MEMS). This material formulation has been optimized for hot roll lamination and processing on MEMS and IC wafers.

DF-3020 is available for sampling in 20um thickness, ±1 μm and can be manufactured from 5 to 25 μm thick. The cured chemistry can withstand harsh environments including resistance to extreme moisture conditions and corrosive chemicals. The DF-3020 film is tougher (less brittle) than most negative photoresists in the market with a glass transition temperature of 165°C (by DMA Tan Delta) and a moderate modulus of 4 GPa at 25°C. The cured chemistry is hydrophobic in nature, providing chemical and moisture resistance.

DF-3020 is compatible with and can be used in contact with the EMS line of spin coatable photoresists. DF-3020 is the latest addition to Engineered Materials Systems' full line of film and liquid negative photo resists formulated for making microfluidic channels on MEMS devices and integrated circuits.

For more information about the DF-3020 negative photo resists or to learn how Engineered Materials Systems can define, develop and create an engineered material solution that is right for your company, visit
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