Sse Gmbh has launched the second generation of the succsefull optiwet st 30 wet processing system

Singen, (PresseBox) - With the second generation of the wet processing System OPTIwet ST 30, SSE GmbH is continuing the successful system platform for Single Substrate Wet Processing.

SSE has integrated several improvements into the well engineered first generation of the OPTIwet ST 30 to offer additional advantages for advanced and safe wet processing.

The OPTIwet ST 30 Wet Processing System is designed for single substrate wet process applications, like:

- cleaning,
- developing,
- etching,
- resist stripping
- lift off.

The improved process chamber with interlocked door provides excellent process results, cleanliness and repeatability for Wafers up to Ø 12" ( 300 mm) and substrates up to 12"x 12"(300mm x 300 mm) and Ø 15,7" (400 mm)

solar-semi GmbH

SSE Sister Semiconductor Equipment GmbH is a global supplier of capital equipment for lithography processing of Wafers and substrates. SSE offers unique solutions based on modular system design, innovative engineering and excellent know how of production processes in clean rooms.

The product portfolio includes laboratory and automated production equipment for the coating, developing and wet processing of wafers/substrates required for the production of Sensors and MEMS for the automotive applications, Bio- and Medical applications, Nanotechnologies, Photovoltaic for space applications, Large substrates (FPD), Semiconductor and Optoelectronic.

In addition SSE designs and manufactures customized equipment for unique and improved customer applications.

In a short period of time, SSE has developed a global customer and partner base through sales offices in Europe, Asia and the USA.

For more information about SSE please visit our web site at www.sse-semi.com

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