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MELCO reports successful installation of AIXTRON MOCVD tool for blue-violet laser
MELCO, (Mitsubishi Electric Corporation) located in Japan has begun operations with AIXTRON's AIX 2600G3 HT system. The 11x2-inch wafer configuration tool will be used for the development and volume production of GaN-based lasers for high-density optical storage and related applications.
MELCO comments: "Our previous experience with our existing AIXTRON G3 MOCVD tools has confirmed the high quality of the engineering, service and process technology.
Those systems have performed very well for the manufacture of AlGaInP-based high-power red lasers. We now look forward to the same high standard of throughput and economics for the new generation of blue-violet lasers."
GaN-based lasers operating over the 390 to 420 nm emission wavelength range are becoming very important commercially. MOCVD has become established as the layer growth method of choice for these and related semiconductor materials. AIXTRON's AIX 2600G3 HT system family was developed to meet the needs of modern production facilities via low overall running costs and low cost of ownership while maintaining high standards for layer quality and uniformity on wafer and wafer to wafer.
For further information on AIXTRON AG (FSE: AIX, ISIN DE0005066203; NASDAQ: AIXG, ISIN US0096061041)
please consult our website at: www.aixtron.com.
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