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High Power Opto Inc. achieved world class red LED on AIXTRON AIX 2600G3 system

(PresseBox) (Aachen, ) AIXTRON AG today announced that a Taiwanese customer has reached a new milestone for red high power LEDs using an AIX 2600G3 Planetary Reactor® system, delivered last year.

High Power Opto Inc. (HPO), located in Taichung, has developed the epi structure for its 622nm metal bond chips on AIXTRON AIX 2600G3 MOCVD reactors.

Dr. K.H. Huang, Chairman of HPO comments: "The results are amongst the best in the world. Keys to our success have been the proprietary HPO metal bond (TW Patent 086340) and mask defined texture process, as well as a highly sophisticated epi process, for which the AIX 2600G3 system is the ultimate platform. With this process, we have been able to improve performance of our packaged HPO MR 40-mil dice to the level of 70lm/W @350mA, corresponding to a wallplug efficiency of 25% at a dominant wavelength of 622nm."

The term Planetary Reactor® is a registered trademark.

Forward-Looking Statements This news release may contain forward-looking statements about the business, financial condition, results of operations and earnings outlook of AIXTRON within the meaning of the "safe harbor" provisions of the United States Private Securities Litigation Reform Act of 1995. Words such as "may", "will", "expect", "anticipate", "contemplate", "intend", "plan", "believe",

"continue" and "estimate", and variations of these words and similar expressions, identify these forward-looking statements. The forward-looking statements reflect our current views and assumptions and are subject to risks and uncertainties. You should not place undue reliance on the forward-looking statements. The following factors, and others which are discussed in AIXTRON's public filings and submissions with the U.S. Securities and Exchange Commission, are among those that may cause actual and future results and trends to differ materially from our forward-looking statements: actual customer orders received by AIXTRON;

the extent to which chemical vapor deposition, or CVD, technology is demanded by the market place; the timing of final acceptance of products by customers; the financial climate and accessibility of financing; general conditions in the thin film equipment market and in the macro-economy; cancellations, rescheduling or delays in product shipments; manufacturing capacity constraints; lengthy sales and qualification cycles; difficulties in the production process; changes in semiconductor industry growth; increased competition; exchange rate fluctuations; availability of government funding; variability and availability of interest rates; delays in developing and commercializing new products; general economic conditions being less favorable than expected; and other factors. The forward-looking statements contained in this news release are made as of the date hereof and AIXTRON does not assume any obligation to update or revise any forward-looking statements, whether as a result of new information, future events or otherwise, unless required by law.


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