Genesis Photonics order a pair of AIXTRON's CRIUS® MOCVD tools

Aachen/Germany, (PresseBox) - AIXTRON AG is pleased to announce a new MOCVD tool order from Genesis Photonics Inc., Tainan, Taiwan, a major player in the high brightness LED market.

The two CRIUS® Close Coupled Showerhead® (CCS) MOCVD tools will be supplied configured as 31x2" for the manufacture of UHB GaN LED products alongside the company's existing Close Coupled Showerhead tools.

Genesis Photonics' Chairman David Chung comments, "Ever since Genesis was founded we have been using the CCS systems. Acknowledging the superiority of CRIUS® 31x2 inch systems, Genesis decided to install two more advanced systems to further boost performance and yield rate of GaN epi wafers.

We therefore decided to migrate all of our outstanding epitaxy technology needs to the largescale CCS technology of the CRIUS® system. We have seen Close Coupled Showerhead® reactors consistently prove themselves for all our LED requirements. They give us great commercial leverage thanks to its dependability along with excellent epilayer uniformity and source material efficiencies. We look forward to the forthcoming commissioning."

Forward-Looking Statements
This news release may contain forward-looking statements about the business, financial condition, results of operations and earnings outlook of AIXTRON within the meaning of the "safe harbor" provisions of the United States Private Securities Litigation Reform Act of 1995. Words such as "may", "will", "expect", "anticipate", "contemplate", "intend", "plan", "believe", "continue" and "estimate", and variations of these words and similar expressions, identify these forward-looking statements. The forward-looking statements reflect our current views and assumptions and are subject to risks and uncertainties. You should not place undue reliance on the forward-looking statements. The following factors, and others which are discussed in AIXTRON's public filings and submissions with the U.S. Securities and Exchange Commission, are among those that may cause actual and future results and trends to differ materially from our forward-looking statements: actual customer orders received by AIXTRON; the extent to which chemical vapor deposition, or CVD, technology is demanded by the market place; the timing of final acceptance of products by customers; the financial climate and accessibility of financing; general conditions in the thin film equipment market and in the macro-economy; cancellations, rescheduling or delays in product shipments; manufacturing capacity constraints; lengthy sales and qualification cycles; difficulties in the production process; changes in semiconductor industry growth; increased competition; exchange rate fluctuations; availability of government funding; variability and availability of interest rates; delays in developing and commercializing new products; general economic conditions being less favorable than expected; and other factors. The forward-looking statements contained in this news release are made as of the date hereof and AIXTRON does not assume any obligation to update or revise any forward-looking statements, whether as a result of new information, future events or otherwise, unless required by law.

AIXTRON SE

For further information on AIXTRON AG (FSE: AIX, ISIN DE0005066203; NASDAQ: AIXG, ISIN US0096061041) please consult our website at: http://www.aixtron.com.

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