Carl Zeiss at Control 2010

New systems for materials research and quality inspection

(PresseBox) (Oberkochen/Jena, ) At CONTROL 2010 to be held in Stuttgart from May 4-7, 2010, Carl Zeiss will introduce its new and proven system solutions for materials research, quality inspection and routine applications.

The Carl Zeiss Industrial Metrology Group will present high precision measuring systems. The visitors to the exhibition expect tailormade process solutions, e.g. for suppliers and manufacturers in the auto industry. Further new hardware and software products enable considerable improvements in measuring performance. You can find details about the innovations of this business group at www.zeiss.de/imt.

The Microscopy Group will show solutions for the examination of large samples, such as solar cells, wafers or flat panel displays, using contrasting techniques. New products will also be presented for use in metallography, inspection tasks in production and for polarization microscopy. New LEDbased accessories are available for stereomicroscopes.

For crosssystem microscopy, a platform for correlative microscopy in materials analysis will be presented that creates a link between a light and a scanning electron microscope.

You can find detailed information about the microscope systems and solutions at www.zeiss.de/control-pr.

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